・Creative problem solver with experience in developing new films for emerging applications and experience in chemistry/materials characterization.
・Works with semiconductor processing equipment to research, develop and optimize unit processes focused on the deposition of metal and dielectric films via PEALD.
・Bringing innovative ideas, staying abreast of state-of-the-art processing applications in the semiconductor industry to be effective.
・Process consulting and accountability including technical papers on advanced process applications and Intellectual Property creation.
・Participates in and drives technical problem-solving sessions using the related scientific method and industry tools, such as Ishikawa diagrams.
・Designs and conducts experiments, in addition to measuring and interpreting experimental output, aimed at fulfilling stated objectives using Design of Experiments (DOE) and Response Surface Methodology (RSM).
・Troubleshoots equipment problems and is personally and actively engaged in problem via “hands-on” modalities.
・Works with customers and central marketing to understand and define requirements to successfully execute and document customer demonstrations.
・Develops methods and techniques for integrating metal and/or oxide films into existing and future device technologies.
・Ensures successful product transfer to customer base by performing demonstrations, training field service personnel, traveling to support remote sites (up to 10% travel required), and drafting documentation regarding process development, tool operation and maintenance.
・Produces technical papers on process, equipment, and device integration improvement strategies and presents to professional audience.
【求められる経験・スキル / Required Experience And Skills】
・PhD degree in Chemical Engineering, Materials Science, Electrical Engineering, or Physics.
・Fresh PhD graduates OR MS degree holder with 2+ years of work experience with: PEALD, ALD, PECVD, CVD, Epitaxy, and/or other thin film deposition.
・Knowledge of electrical characterization techniques for CMOS devices.
・Application of dielectric and/or metal films for logic and memory structures.
・Knowledge of electrical characterization techniques for CMOS devices is preferred.
・Ability to independently manage complex process development projects, including personnel, project schedules, experimental thrusts, hardware procurement and budgetary oversight.
・Understanding of requirements for integration of metals as work function materials and barrier layers in FEOL and BEOL process flows
・Demonstrated ability to develop and completely characterize deposition processes using first principles and experimental design techniques (e.g., DOE, RSM).
・Experience with the theory, practice, and interpretation of materials characterization techniques such as XPS, SIMS, RBS, AFM, XRD, HRTEM, FESEM, Auger, Raman and ellipsometry.
・Excellent verbal and written communication skills in both English and Japanese, with ability to clearly communicate advanced technical constructs in direct and concise manner.
【学歴】
大学卒業以上
【職種 / type of occupation】
プロセスエンジニア, プロセス開発
【給与 / salary】
年収 600 〜 1,250万円
【賞与】
【雇用形態 / employment status】
正社員
雇用期間
期間の定めなし
試用期間
有り
【就業時間 / working hours】
09:00～18:00
【休日休暇 / holiday】
日曜日,土曜日,祝日
【保険 / social insurance】
健康保険,厚生年金保険,雇用保険,労災保険
【待遇・福利厚生】
受動喫煙防止措置
敷地内禁煙
【業種 / industry】
電気・電子・半導体
※詳細はお仕事のご紹介時にお伝えします
Job ID: VAC-287731/
